Physical vapor deposition (Physical Vapor Deposition, PVD) tekinoroji inoreva kushandiswa kwemaitiro epanyama pasi pevacuum mamiriro ekuputira pamusoro pechinhu chinobva (chakasimba kana mvura) kuita maatomu egasi kana mamorekuru, kana kuti ionize muzvikamu, uye kupfuura nepasi. -pressure gasi (kana plasma). Maitiro, tekinoroji yekuisa firimu rakatetepa rine basa rakakosha pamusoro peiyo substrate, uye yemuviri mhute deposition ndeimwe yehukuru hwepamusoro kurapwa matekinoroji. PVD (physical vapor deposition) tekinoroji yekuputira inonyanya kukamurwa kuita zvikamu zvitatu: vacuum evaporation coating, vacuum sputtering coating uye vacuum ion coating.
Zvigadzirwa zvedu zvinonyanya kushandiswa mukupisa evaporation uye sputtering coating. Zvigadzirwa zvinoshandiswa mukuiswa kwehuputi zvinosanganisira tungsten strand waya, mabhoti etungsten, mabhoti emolybdenum, uye mabhoti etantalum izvo zvigadzirwa zvinoshandiswa mukuputira maerekitironi danda, cathode tungsten waya, copper crucible, tungsten crucible, uye molybdenum processing parts Zvigadzirwa zvinoshandiswa mukuputira simbi zvinosanganisira titanium. zvinangwa, chromium zvinonangwa, uye titanium-aluminium zvinangwa.
