Erekitironi beam evaporation method imhando yevacuum evaporation coating, iyo inoshandisa matanda erekitironi kupisa zvakananga zvinhu zvekubuda mumhepo pasi pemamiriro evacuum, kufambisa zvinhu zvekupupuma uye kuzvitakura kuenda kune substrate, uye condena pane substrate kuita firimu rakatetepa. Mune electron beam heat device, chinhu chinopisa chinoiswa mumvura-yakatonhorera crucible, iyo inogona kudzivisa kuita pakati pe evaporation zvinhu uye crucible wall uye kukanganisa kunaka kwefirimu. Multiple crucibles anogona kuiswa muchishandiso kuti awane panguva imwe chete kana kupatsanura evaporation uye kuiswa kwezvinhu zvakasiyana. Ne electron beam evaporation, chero zvinhu zvinogona kubuda.
Electron beam evaporation inogona kubuda yakakwira-melting point zvinhu. Kana ichienzaniswa neyakajairwa kupisa kupisa evaporation, ine yakanyanya kupisa kunyatsoshanda, yakakwirira danda ikozvino density, uye nekukurumidza evaporation kumhanya. Firimu uye firimu rezvakasiyana optical zvinhu senge conductive girazi.
Hunhu hwemaerekitironi beam evaporation ndeyekuti haizovharidzire kana kashoma kuvhara mativi maviri echinangwa chetatu-dimensional chimiro, uye kazhinji inongoisa panzvimbo yainotarirwa. Uyu ndiwo mutsauko uripo pakati pe electron beam evaporation uye sputtering.
Electron beam evaporation inowanzoshandiswa mumunda wekutsvaga semiconductor uye indasitiri. Iyo inokwidziridzwa erekitironi simba rinoshandiswa kurova icho chinonangwa, zvichiita kuti icho chinonangwa chinyunguduke nekusimuka. Pakupedzisira yakaiswa pane chinangwa.
Nguva yekutumira: Zvita-02-2022